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Measurement of the birefringence distribution in high resolution laser scanning lensesHEE SUNG CHO; YUN WOO LEE; JAE HYEOB LEE et al.Proceedings of SPIE, the International Society for Optical Engineering. 2005, pp 602413.1-602413.7, issn 0277-786X, isbn 0-8194-6055-9, 1VolConference Paper

Immersion Specific Error Contribution to Overlay ControlD'HAVE, Koen; LAIDLER, David; CHENG, Shaunee et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72720D.1-72720D.6, 2Conference Paper

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Extending Immersion Lithography to the 32nm NodeWARRICK, Scott; CONLEY, Will; FARYS, Vincent et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 652015.1-652015.11, issn 0277-786X, isbn 978-0-8194-6639-6Conference Paper

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Novel depolymerizable topcoat for immersion lithographyPENG ZHANG; WEIGEL, Scott J; BRAYMER, Tom et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6196-2, 2Vol, Part 1, 61531N.1-61531N.7Conference Paper

Recent performance results of Nikon immersion lithography toolsHAZELTON, Andrew J; SHIRAISHI, Kenichi; WAKAMOTO, Shinji et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, issn 0277-786X, isbn 978-0-8194-7109-3, Part II, 69241N.1-69241N.8Conference Paper

Current status of water immersion lithography and prospect of higher index methodOWA, Soichi; NAKANO, Katsushi; NAGASAKA, Hiroyuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 653304.1-653304.5, issn 0277-786X, isbn 978-0-8194-6655-6Conference Paper

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Analysis of the Effect of Point-of-Use Filtration on Microbridging DefectivityBRAGGIN, J; GRONHEID, R; CHENG, S et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72730S.1-72730S.10, 2Conference Paper

L'optique en ligne de mire = Optics in the line of sightFERRARI, Thierry.Technologies internationales (Strasbourg). 2005, Num 119, pp 27-30, issn 1165-8568, 4 p.Article

Scatterometry Sensitivity for NIL ProcessMIYAKAWA, Takahiro; SATO, Kazuhiro; SENTOKU, Koich et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701N.1-79701N.7Conference Paper

Defect performance of a 2X node resist with a revolutionary point-of-use filterBRAGGIN, J; RAMIREZ, R; WU, A et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76391E.1-76391E.8, 2Conference Paper

Challenges of long term process stability and solutions for better controlCHOI, Jinphil; SEONG, Nakgeuon; LEE, Sangho et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 727234.1-727234.8, 2Conference Paper

Characterization of film cut position at wafer bevel for effective immersion lithography processMATSUMARO, Kazuyuki; SEKI, Miyoshi; KATO, Takeshi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 727325.1-727325.10, 2Conference Paper

Extending Single-Exposure Patterning Towards 38-nm Half-Pitch Using 1.35 NA ImmersionBOUCHOMS, Igor; ENGELEN, Andre; SPERLING, Frank et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 72741K.1-72741K.10, 2Conference Paper

Focus, Dynamics and Defectivity Performance at Wafer Edge in Immersion LithographyTAMURA, Takao; ONODA, Naka; FUJITA, Masafumi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692419.1-692419.12, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

CD Metrology by an Immersion Microscope with High NA Condenser Lens for 45 nm Generation MasksYAMANE, Takeshi; TANIGUCHI, Rikiya; HIRANO, Takashi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 660711.1-660711.6, issn 0277-786X, isbn 978-0-8194-6745-4Conference Paper

Assembly of a 193-nm interferometer for immersion lithography : vibration effects on image contrastLAGRANGE, Alex; CHARLEY, Anne Laure; LARTIGUE, Olivier et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6197-0, vol 3, 61544O.1-61544O.5Conference Paper

Thermodynamic characterization of a regenerated activated carbon surfaceGONZALEZ-MARTIN, M. L; GONZALEZ-GARCIA, C. M; GONZALEZ, J. F et al.Applied surface science. 2002, Vol 191, Num 1-4, pp 166-170, issn 0169-4332Article

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Determination of hydrogen in aluminum melts by degassing the samples in an immersion probeVASSERMAN, A. M.Journal of analytical chemistry (New York, NY). 1998, Vol 53, Num 5, pp 472-479, issn 1061-9348Article

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Plasma immersion ion implantation reactor design considerations for oxide chargingEN, W; LINDER, B. P; CHEUNG, N. W et al.Surface & coatings technology. 1996, Vol 85, Num 1-2, pp 64-69, issn 0257-8972Conference Paper